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In a p-type Si at 300 K and $$N_a = 8 \times 10^{15} cm^{-3}$$, variation of space-charge density in the semiconductor as a function of surface potential is plotted, then select the true statement for weak inversion region. Given that $$p_{s}$$ and $$n_{s}$$ are hole and electron concentrations at the surface.
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